He-Cd 레이저와 근접장현미경을 이용한 폴리머박막 나노리소그라피 공정의 특성분석

Characteristics of nanolithograpy process on polymer thin-film using near-field scanning optical microscope with a He-Cd laser

  The shape and size variations of the nanopatterns produced on a polymer film using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture(P<SUB>in</SUB>), scan speed of the piezo stage(V), repeated scanning over the same pattern, and operation modes of the NSOM(DC and AC modes). The pattern size remained almost the same for equal linear energy density. Pattern size decreased for lower laser beam power and greater scan speed, leading to a minimum pattern width of around 50nm at P<SUB>in</SUB>=1.2㎼ and V=12㎛/s. Direct writing of an arbitrary pattern with a line width of about 150㎚ was demonstrated to verify the feasibility of this technique for nanomask fabrication. Application on high-density data storage in discussed.