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Laser Induced Crystallization of Amorphous Si Films on Glass Substrates
- 한국레이저가공학회
- 한국레이저가공학회지
- 한국레이저가공학회지 제13권 제1호
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2010.036 - 10 (5 pages)
- 168
Crystallization of 100 nm thick amorphous silicon (a-Si) films on glass substrates was carried out by using a double laser irradiation method. Depending on a-Si deposition method or glass types, the quality of crystallized silicon film, varies significantly. For a-Si films deposited with high concentration of impurities, large grains or high crystallinity can not be achieved. Crystallization with different a-Si deposition methods confirmed that for the polyclystallization of a-Si films on glass substrates, controlling the impurity density during substrate preparation is critical.
1. 서 론
2. 실험장치
3. 실험결과 및 고찰
4. 결 론
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