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Internal modification in transparent materials using plasma formation induced by a femtosecond laser

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The fabrication of internal diffraction gratings with photoinduced refractive index modification in transparent materials was demonstrated using low-density plasma formation excited by a femtosecond (130 fs) Ti: sapphire laser (λ<sub>p</sub>=800 nm). The refractive index modifications with diameters ranging from 1 μm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2.0×10¹³ W/㎠. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.

Abstract

1. Introduction

2. Experimental Setup

3. Experimental Results and Discussion

4. Conclusion

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