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MAS(A1-A1₂O₃-Si)構造의 Carrier 注入에 대한 Flat band 電壓 變化

The Variable Flat-band Voltage depend on injection carrier in MAS(A1-A1₂O₃-Si)structure

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We can find that the main causes of the defect in MOS devices depend on unstable charging phenomena of Si0₂-Si interface. The characteristics of MAS have more advantages than them of MOS in the flat band voltage change vs carrier injection time. If the advantages are applied, the time change rates of memory are able to be improved, and MAS devices are applicable to the stable capacitive circuit.

ABSTRACT

1. 序論

2. 理論

3. 實驗 및 測定過程

4. 實驗結果 및 考察

5. 結論

參考文獻

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