학술저널
폐놀계 화합물과 포름알데히드의 축합반응으로부터 노볼락 레진의 합성
Synthesis of novolac resins by condensation of phenolic compounds with formaldehyde
- 한국응용과학기술학회 (구.한국유화학회)
- 한국응용과학기술학회지
- 한국유화학회지 제24권 제3호
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2007.09309 - 318 (10 pages)
- 55
Novolac is widely used as the primary solid component of most photoresists in semiconductor and microelectronic devices. In this study, novolac resins were prepared by condensation of 35% formaldehyde with phenolic compounds such as m-/p-cresol, 2,5-dimethylphenol and bisphenol A in the presence of oxalic acid as catalyst. The average molecular weight (Mw) of these novolac resins has been varied on the changing of mixing ratio of m-/p-cresol/2,5-dimethylphenol/bisphenol A or formaldehyde/phenolic compound. Also, thermal properties of novolac were observed by TGA.
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