학술저널
A LD (원자층증착)을 이용한 ZnO nano film 의 제조
Preparation oi ZnO nanofilm b y atomic layer deposition
- 호서대학교 공업기술연구소
- 공업기술연구 논문집
- 제26권 제1호
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2007.0687 - 95 (9 pages)
- 9
ZnO nano film for transparent thin film transistors is prepared by injection type source delivery system of atomic layer deposition. By using this delivery system the source delivery pulse time can dramatically be reduced to 0.005s in ALD system. ZnO nanofilms obtained at 150°C are characterized.
i. 서 콘
II. 실 험
III. 실험결고ᅡ 및 고찰
III. 결 론
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