학술저널
오존을 이용한 웨이퍼 세정 및 감광막 제거 공정
Wafer Cleaning & Photoresist Strip Processes using Ozone
- 호서대학교 공업기술연구소
- 공업기술연구 논문집
- 제22권 제1호
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2003.0613 - 19 (7 pages)
- 2
This paper has been studied on wafer cleaning and photoresist stnp m g in sem iconductor or L C D fabrication processes using ozone solved deionized w ater. F or the purpose of th is study, w e have developed high concentration ozone generating system and h ig h contact ratio ozone solving system to get high efficiency D IO 3 . T hrough th is study, w e obtained 11 % ozone gas concentration, 99.5 % of ozone efficiency and m axim um 139.1 p pm (m g /L ) of solubility in deionized w ater.
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n ■ dio3 공정
in. 실험 및 분석
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