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학술저널

PET 기판 위에 스퍼터 압력 변화에 따라 제조된 ITO 박막의 특성에 관한 연구

A Study on the Properties due to Sputter Pressure of ITO Thin Films Prepared on the PET Substrate

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We prepared ITO films on PET substrate by DC magnetron sputtering method using powdery target with different sputter pressure. The deposited rate, XRD(x-ray diffraction), resistivity, transmittance and reflectance were investigated. As the sputtering pressure was higher, the resistivity of ITO films increased. As the working pressure increased, the optical transmittance improved at visible region of light.

Ⅰ. 서 론

Ⅱ. 실험방법

Ⅲ. 실험결과 및 고찰

Ⅴ. 결 론

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