급속열처리 방법에 의한 Indium Tin Oxide Films의 제조 및 특성평가

Preparation and Evaluation of the Properties of Indium Tin Oxide Films Deposition by Rapid Thermal Annealing

ITO/glass thin films were prepared by RF magnetron sputtering method and some of the samples were treated by rapid thermal annealing(RTA) and process at same temperatures ranging of 500℃. The effects of RTA treatment on the structural properties were studied by using X-ray diffraction and atomic force microscopy while optical properties were studied by the photoluminescence measurements. It is observed that the ITO film annealed at 500℃ at 5minmute nitrogen ambient gas reveals the strongest XRD emission intensity and narrowest full width at half maximum among the temperature studied. The enhanced UV emission from the film annealed at 500℃ 5minmute nitrogen ambient gas is attributed to the improved crystalline quality of ITO film due to the effective relaxation of residual compressive stress and achieving maximum grain size.