Diamond-like carbon film의 열적거동에 관한 연구

A study on thermal behavior of Diamond-like carbon film

Diamond-like carbon(DLC) thin films with interlayer were deposited on silicon substrate using a reactive sputtering method. The thermal stability of the films was investigated by annealing the films for 1hr in air in the range of 100 to 500℃. The I D /I G ratio increased with increasing temperature as related to the sp 3 -to-sp 2 transition. Accordingly, G-position shifting started from 150℃ in the DLC films and from 270℃ in the a-Si/DLC films. Moreover, in the case of the a-Si/DLC films the film still observed even after annealing at 500℃. The thermal stability of the reactive sputtered DLC films appeared to be improved by the a-Si interlayer.