365nm 파장의 고효율 UVLED 집광 렌즈 설계를 통한 웨이퍼 주변노광 시스템 성능평가

Performance Evaluation of Wafer Edge Exposure System Considering Design of 365-nm-Wavelength High-Efficiency UVLED Light-Condensing Lens

This paper reports on the development and process evaluation of a novel wafer edge exposure (WEE) system for application in semiconductor-manufacturing equipment. Conventional WEE systems involve a 365-nm-exposure light source in the form of a mercury lamp; the WEE system proposed herein involves the use of an LED light source, which has the characteristics of lower power consumption and longer life, as compared to the mercury lamp, and it is also more environmentally friendly. Using the techniques of optical lens design and development, a high-efficiency lens module is fabricated successfully, owing to which, the LED light source can focus on the photo resist, increase the intensity, and obtain stable and uniform optic power. The intensity of the LED lamp using the new designed lens module exceeds 1,500 mW/cm2, and the results of the actual process performance evaluation demonstrate that the device exhibits nearly the same performance as those of the existing products in terms of accuracy and repeatability. It is expected that this research will contribute to reduce semiconductor manufacturing costs and alleviate environmental issues.