전자소자 응용을 위한 소프트 리소그라피 기반 나노 소재 패터닝

Nanomaterials Patterning based on Soft Lithography for Electronic Applications

Soft lithography has emerged as a versatile and cost-effective technique for patterning nanomaterials, offering multiple advantages over traditional photolithography in terms of material compatibility, simplicity, and cost efficiency. This review article aims to highlight recent developments in soft lithography methods, including nanoimprint lithography, capillary force lithography, soft stencil lithography, microcontact lithography, laser-assisted transfer lithography, and intaglio transfer lithography. Fundamental principles, unique features, and advantages of each technique are discussed along with their applications in nanomaterial patterning. Furthermore, the integration of these methods with advanced electronic devices is investigated, emphasizing their potential to achieve high-resolution patterning while preserving nanomaterial integrity. This review is concluded with insights into the future prospects of soft lithography as a pivotal tool to replace photolithography in next-generation electronic device fabrication, particularly for flexible and wearable applications.