국가지식-학술정보
Molecular Emission of CF<sub>4</sub> Gas in Low-pressure Inductively Coupled Plasma
Molecular Emission of CF<sub>4</sub> Gas in Low-pressure Inductively Coupled Plasma
- 대한화학회
- Bulletin of the Korean Chemical Society
- Vol.27 No.3
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2006.01373 - 375 (3 pages)
- 0
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$CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.
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