국가지식-학술정보
Atomistic Simulation for a Nano-CMOS Process: From Ion Implantation to Diffusion
Atomistic Simulation for a Nano-CMOS Process: From Ion Implantation to Diffusion
- 한국물리학회
- Journal of the Korean Physical Society
- 49(3)
-
2006.091260 - 1265 (6 pages)
- 0
커버이미지 없음
(0)
(0)