전기자극이 치과용 임프란트 주위 골세포에 미치는 영향에 관한 연구(II) -전기자극의 세기에 따른 골세포의 영향
- 우경엽 최영철 이백수 권긍록
- 대한치과이식임플란트학회
- Journal of Dental Implant Research
- 제20권 제1호
- 등재여부 : KCI등재후보
- 2001.12
- 68 - 74 (7 pages)
Several factors can affect the formation of bone tissues surrounding implants. One of the factors is electrical stimulation. It is known to change the movement of cells, form and destroy cells, and alter concentration and chemical component of soft tissues and bones. The effect of electrical stimulation on bone formation can vary according to the intensity of electric currents, stimulating time, the method of sending electric currents, and tissues and cells currents are applied to. This study examines how the intensity of electric currents affect osteoblasts. First, cells were produced with varying amperes of electric currents. Then, changes in the number and distribution of osteoblasts were analyzed. Osteoblast-like cells were raised on four plates where implants can be placed. A constant current sink (MC3T3- E l) that can adjust the intensity and stimulating time of electric currents was used. The four plates were stimulated with OB入,108A, 208A, and 406A, respectively. After 24 hours of stimulation, the number and distribution of cells surrounding implants were examined. The following are the results: 1. The distribution of cells surrounding implants increased in proportion to the intensity of electric currents of up to 20BA. But the distribution decreased when 406入 of electric currents was sent. 2. The number of cells surrounding implants increased in proportion to the intensity of electric currents of up to 20BA. But the number decreased when 4013A of electric currents was sent. The results of this study shows that 206A of electric currents increases the number and distribution of cells in osteoblasts. Since electric currents can help bone formation, clinical applications of electric currents to implants are expected to promote the process of osseointegration.
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