반도체 공정의 폐가스 처리를 위한 친환경 System 개발

Point of Use (POU) Scrubber Systems for Semiconductor Process Emissions

Three types of Point of Use (POU) gas abatement equipments for PFCs were demonstrated in this paper. Their main parts and gas treatment mechanisms were well introduced. In addition, abatement efficiencies related to PFCs for each other were tested and compared. Results show that heat-wet type scrubbers have removal efficiency about 95% for NF3. Burn-wet and arc plasma type scrubbers exhibit about 95-96% removal efficiency for CF4 and 97-96% for SF6 gas treatment.